Used MRC 643 #193489 for sale

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MRC 643
Sold
Manufacturer
MRC
Model
643
ID: 193489
Sputtering system (2) cryo pumps, (2) 13"x13" cathodes targets and (1) blank target (1) Alumnium cathode, (1) Titanium, (1) blank RF Power Supply and DC Generator 208 V, 100 A, 50 Hz, 3 Ph Chamber still under vacuum MRC 8080 Microprocessor controller Pumps down to 10^-7 Torr.
MRC 643 is a versatile sputtering equipment designed by MRC Ltd. It utilizes a dual-source magnetron DC power supply to deposit metals or oxides onto substrates, making it ideal for a wide range of applications. The system also offers three independent targets with a combined target area of up to 800mm wide, and it can accept wafers up to 6" and substrates up to 200mm in diameter. 643 unit allows for sputtering of both single and multiple targets simultaneously for high productivity, and it further enables the deposition of multilayer films as well. The machine also features a comprehensive process control unit with programmable parameters such as DC voltage, gas control, and chamber temperature. Additionally, the tool allows for easy adjustment of process parameters to accommodate the specific requirements of each application. In terms of safety and reliability, MRC 643 is engineered with multiple safety features, including a built-in control asset and a 20-element gas monitoring model. The equipment also includes a triple display monitor and a series of warning lights that alert operators to any malfunctions or critical conditions. 643 is a highly efficient and robust system that is well-suited for a wide range of sputtering deposition environments. With its advanced safety features, multiple sputtering targets, and ability to deposit complex layers, the unit is perfect for applications such as thin film solar cells, biomaterial coatings, and integrated circuit coatings. Furthermore, with its control unit and adjustable process parameters, the machine is able to process multiple materials with ease and accuracy for a range of diverse applications.
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