Used MRC 643 #293758605 for sale

MRC 643 is a reactive, direct-current (DC) magnetron sputtering equipment consisting of two cathodes, two planar magnetrons, two power supplies and two vacuum chambers for processing materials for thin film deposition on substrates. The system is designed with a top-loading, three-axis drive mechanism, allowing for high throughput of materials. This can further be enhanced by the use of advanced optical automation tools. The center chamber is typically used as the substrate holder with the outer chamber containing the sputter source. The power-supplied, DC magnetron sputtering is created by a strong magnetic field, which improves the uniformity of the deposition process. The magnetron-cathode pair is placed in a chamber in which the pressure can be controlled precisely. The controlled environment of the chamber also keeps the process stable and reliable. MRC 663 unit also features thermionic emission for pre- and post-sputtering cleaning of the chamber walls, making it an effective tool for depositing multiple layers of film. Through programming of the dwell and ramp times during deposition, it is possible to get the desired bulk and surface properties of the films. Owing to its efficient, automated cleaning process, the machine is well suited for applications such as semiconductor fabrication and thin film deposition. MRC 663 tool also features pressure control and is capable of processing a wide range of materials, including metals, alloys, oxides and sulfides. The pressure control in the asset allows for a much more controlled deposition, allowing for increased precision and accuracy in the process. All of these features make MRC 663 model an attractive choice for all thin film deposition applications, from purely decorative applications to more complex high-tech applications.