Used MRC 643 #293810159 for sale

MRC 643 is an advanced rectangular magnetron sputtering equipment designed to handle substrate sizes up to 643mm x 1073mm (25.3" x 42.3"). This versatile tool is designed for high-rate production deposition and accommodates multiple targets for up to four process chambers. It also features a sophisticated internal sample transiting system, using dual floating arm transporters in each chamber and three independent controllers for full chamber control. The sputtering unit utilizes powerful electromagnets and a high-power RFcompact source to generate a focused plasma in the process chamber. This results in efficient sputter etching, coating, and film deposition, allowing for the execution of complex designs with excellent surface quality and minimal contamination. Due to its large substrate table and multiple target configuration, the machine can deposit a wide variety of materials, including metals, alloys, ceramic, and dielectrics. 643's user-friendly, highly automated features include an intuitive software interface and a digitized, color-coded chamber cycle timer. The interface allows operators to control the process parameters and provides accurate, real-time feedback on the process settings, temperatures, and pressure. All tool status and process parameters are stored on a secure server to ensure accuracy and reliability. Additionally, a built-in auto start/stop function automatically manages substrate loading and unloading. Additional features of MRC 643 asset include a compact swing-arm autoloader and an industry-best 5 micron substrate accuracy rating. This ensures consistent accuracy across multiple substrates and wafers up to 1 inch thick. Additionally, the model accepts a wide range of standard chemistries for optimal performance and compatibility. As part of its standard package, 643 comes with robust safety protocols built into the equipment for maximum protection of personnel and the equipment. In conclusion, MRC 643 sputtering system is an efficient and reliable tool for substrate deposition, etching, and coating. Its robust design ensures consistent quality and accuracy, while its large substrate table and multiple target support make it an ideal solution for high-rate production applications.