Used MRC 643 #9124209 for sale

MRC 643 is a high performance DC magnetron sputtering equipment that is designed to enable high throughput deposition of materials for a variety of applications. It has a configurable three-zone chamber configuration which can support up to three deposition cathodes, allowing for high density multi-layer film stacks. The system is equipped with a power supply of up to 5000 Watts and is capable of a sputtering power of up to 2500 Watts, meaning it can cover a wide range of applications. The three-zone chamber configuration of 643 is ideal for the deposition of multi-layer stacks, as the substrate and deposition cathodes can be spatially separated to avoid contamination of the substrate or deposition layers. The chamber also includes additional features such as an integrated pressure control unit which offers a fast and reliable pressure control with a minimum set pressure of 1 mTorr and a maximum set pressure of 4 Torr. MRC 643 also offers excellent mass transport to the substrate, enabled by a six-finger load lock design that ensures uniform mass transport to the substrate surface. The deposition rates of the film layers can be easily controlled, allowing for a range of deposition rates from ~1-10 Å/sec. It is also capable of performing reactive sputtering processes as well as in-situ cleaning and etching of substrates, allowing for increased control during process implementations. 643 is also equipped with well-developed safety protocols which provide reliable protection for both the machine and personnel. The entire sputtering tool is controlled by a computer-programmable, proprietary control software. It is capable of creating semi-automated processes, which saves time and reduces human error. Overall, MRC 643 provides an excellent sputtering asset that is capable of high throughput processing and film deposition of a variety of materials, making it an ideal model for various surface engineering applications.