Used MRC 643 #9179315 for sale

MRC 643 is a full-featured sputtering equipment produced by Enthone-OMI, Inc. It is an advanced piece of scientific equipment that is used for large-scale physical vapor deposition (PVD) of metal films, coatings, and protective materials. The system utilizes up to four independently-controlled electron-gun ion sources as well as up to four metal target materials, which can be individually sputter-coated onto a variety of substrates. To ensure the highest degree of accuracy and uniformity, 643 is equipped with a state-of-the-art microprocessor-based control unit and a closed-loop feedback monitor capable of detecting the smallest changes in deposition conditions. MRC 643 is capable of producing a variety of PVD coatings, such as aluminum, brass, bronze, chromium, cobalt, gold, graphite, indium, iron, lead, nickel, palladium, rhodium, silver, tin, titanium, tungsten, and zinc. The machine also offers a wide range of chamber configurations, allowing users to choose from a wide range of working pressures (up to 200 mbar) and gas mixes (such as nitrogen, argon, and carbon dioxide). This flexibility makes 643 an ideal choice for the development of industrial and laboratory applications from home entertainment systems to medical devices and aerospace components. MRC 643 also offers a high degree of flexibility in terms of substrate manipulation. It is capable of accepting substrates in a variety of sizes and shapes, ranging from simple flat surfaces to complex geometrical shapes with highly reflective surfaces, as well as a wide variety of non-metallic materials. Additionally, 643 is equipped with a rotary table that allows the substrate to be rotated in order to ensure uniform sputtering. Overall, MRC 643 is a highly advanced and reliable sputtering tool that offers users a wide range of possibilities to create and develop a variety of sophisticated PVD coatings and substrates. Its intuitive user interface and comprehensive feedback asset ensure that users can carry out precise and consistent sputtering operations, making it an ideal choice for research and industrial applications.