Used MRC 643 #9206604 for sale

MRC 643 is a high-performance sputtering equipment designed for long-term, high-throughput, accurate thin-film deposition. It utilizes multiple target-pumped magnetron sputtering heads enabled by a high-power RF generator for a superior control over uniform coating and layer thicknesses. The system utilizes its proprietary advanced film-growth engine to ensure the highest target utilization and deposition film homogeneity, and is easy to use with a user-friendly graphical user interface (GUI). The sputtering chamber of the unit is fitted with an upper eye-bolt network for easy access to the inside, as well as with a load-lock for improved throughput rates. The lower section of the chamber is comprised of two separate chambers - one heated to a maximum of 330 C and the other designed for dry etching - and can be loaded with up to two separate substrate wafers. Additionally, the chamber can accommodate substrates with up to 200 mm in diameter. The machine includes a robust cooling circuit with additional optional temperature control, enabling substrate temperatures down to 100°C. The Pulse-Width Modulated (PWM) DC-DC converters have individually-controlled targets, controlled by the GUI. All parameters of deposition are collected and stored by the automated record-keeping tool of the GUI. Apart from the ultra-high deposition rate enabled by the multiple-target sputters, the asset offers excellent film uniformity from all sputtering angles. It has high repeatability and reproducibility of results with low defect inclusion and unmatched film properties. It also offers a wide range of possible stoichiometries, and enables simple and fast set-up for different deposition requirements. Overall, 643 sputtering model has become a widely utilized tool for thin-film deposition, especially when accuracy and speed are key. It offers superior control over uniform coating and layer thicknesses, enabling the creation of stable, high-performance films for a wide range of applications.