Used MRC 643 #9229736 for sale

MRC 643 is a sputtering equipment used in the center of materials and structures, developed by Cambridge Nanotech. The system is designed to provide specialised material characterization and circuit fabrication services, with special features such as an integrated ion source for precision deposition of ultra-thin films. The product is a powerful and versatile surface analysis device, with sputtering capabilities for depositing metal coatings and electrical circuits. 643 sputtering unit features a range of sputtering guns that provide controlled deposition of metal films over a wide area. The sputtering guns produce a high-quality, uniform coating on the substrate material, resulting in superior contact resistance and uniform dopant incorporation. The guns are marked with: RF, DC/RF, and Diode, allowing optimal sputtering techniques to be chosen according to the application. The machine also features a high-frequency waveform generator to control the sputtering process, and a flexible substrate holder allowing the deposition of complex geometries. Additionally, the tool is equipped with a special chamber to accommodate and protect the substrates during sputtering. The chamber is designed with a uniform, flat bottom for a uniform sputtered film. The asset also features an integrated ion source for precise doping, which eliminates source bias and prevents impurities from contaminating the material during deposition. The ion source also features a low-energy deposition setup, allowing for direct doping of highly sensitive designs and components. Finally, the model is housed in a rugged and reliable stainless steel enclosure, designed to provide efficient, safe, and stable operation in industrial or laboratory environments. The enclosure is equipped with a air-locked safety chamber, and can be cooled down to -60°C to ensure superior performance. Overall, MRC 643 is a versatile sputtering equipment, providing advanced precision deposition of metal films and electrical circuits. It features high-frequency waveform generators, an integrated ion source, a robust and reliable stainless steel enclosure, and a low-energy deposition setup for optimal results. The system is suitable for a wide range of applications, from complex geometries to highly sensitive designs.