Used MRC 643 #9303325 for sale
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MRC 643 is a state-of-the-art sputter deposition equipment designed by the Material Research Corporation (MRC). This system is capable of depositing multiple films of various materials at rates of up to 100 nanometers per minute and has a maximum chamber size of 450x450x 450mm. 643 is one of the most versatile sputter deposition systems available on the market today, and is capable of depositing films from many different materials. MRC 643 is ideal for a variety of applications and can be used to deposit films for a number of different surface engineering and thin-film applications such as metal inert gas (MIG) coatings, optical coatings, solar cells, LCDs and semiconductor devices. The unit also includes a range of programmable parameters such as temperature control and process control to ensure a high-quality deposition every time. The machine is equipped with a 400kHz power supply, which is capable of supplying high-voltage to achieve a maximum deposition rate of over 100 nanometers per minute. The tool also includes a controller, a floating substrate holder, a gas delivery asset, and a cooling model. An Auto-Equipment Calibration Helper (ASH) program is also available to make sure the system is operating at optimum levels. 643 is composed of a mainframe including the main controller, power supply control board and two independent process chambers. The two process chambers feature independent control enabling them to be used for parallel deposition processes or for co-deposition processes. MRC 643 unit also features a number of safety features such as chamber interlocks, a vent machine, purging capability and a thermal runaway protection. 643 is a reliable, versatile and cost effective sputter deposition tool and has been proven to be customers top choice sputtering asset. The model offers precise control of film deposition parameters and excellent reproducibility. Whether you are looking for thin film deposition or Metal Inert Gas (MIG) coatings, MRC 643 can be customized to meet any needs.
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