Used MRC 693 #9179537 for sale

MRC 693 is a compact sputtering equipment designed for plasma-enhanced deposition processes. It is a three-zone sputtering system, featuring a turn-over load-lock with an integrated pre-evacuation chamber. The unit utilizes a standard 300mm (12-inch) substrate holder with a fit-for-purpose bellows assembly and can support up to eight targets with diameters of up to 114mm (4.5-inches). A compact process chamber is equipped with a 400S Series Sputter power supply and an ICP radio frequency (RF) power supply designed for high deposition control and substrate uniformity. The chamber also features a cylindrical, tiltable, out-of-vacuum load lock to enable easy substrate loading and unloading to reduce cycle time. The base pressure of 693 is highly stable thanks to its linear motion o-ring seal machine and integral cooling and heating systems. Its gas processing tool includes an inlet cooling asset and a gas circulation model. A turbo-molecular pump, being its primary vacuum pump, allows the equipment to achieve an operating pressure range of 10^-7 Torr with a turbo Speed of 2,700 l/s. MRC 693 is controlled and monitored using a highly intuitive user interface. It enables users to customize and automate the operating parameters and efficiently optimize the process. The touch-screen based interface also allows precise adjustments to be made on sputtering power, deposition rate, and RF power. Its intelligent feed-back control loop ensures that the system runs with high accuracy and repeatability. As a safety measure, the unit is housed in two layers of steel cabinets which protect from any unwanted X-rays. The machine is also equipped with a safety switch that cuts off all power to the unit in case of any emergency shutdown. In conclusion, 693 is a highly versatile and energy-efficient sputtering tool. Its reliability and intuitive controls makes it a perfect choice for various sputtering processes.