Used MRC 693 #9302975 for sale

MRC 693 is a sputtering equipment designed and manufactured by MRC. It is used in research and development of semiconductor devices, integrated circuit (IC) packages, opto-electronic devices, and other thin film applications. This high-performance system is capable of depositing thin films with excellent uniformity and excellent step coverage over large areas. The main components of 693 include a Tungsten-Halogen lamps, for linear illumination of sputtered targets; an RF power supply and sputtering guns; gas distribution systems; an integral vacuum unit; a rotatable substrate holder; and a vacuum controller. The lamps and the RF power supply are adjustable to provide precise control of the parameters necessary to deposit high-quality thin films. The Tungsten-Halogen lamps are used with an adjustable current control to provide an adjustable range of radiometric power for uniform illumination of the sputtered target. The RF power supply is used to create the plasma state required for sputtering of target material onto the substrate. A unique feature of MRC 693 is the gas distribution machine. It uses patented gas injectors to control the gases used during the sputtering process; this ensures a uniform sputtering rate over large substrates. The gas distribution tool also permits a good range of pressure, which is key for maintaining high-quality film deposition. In addition, the unit is equipped with an integrated vacuum asset that uses a rotary-vane vacuum pump to achieve a base pressure of 2 mbar or less. 693 is a versatile sputtering model that is well suited for a number of thin film applications. It can deposit thin films with excellent step coverage over large areas and provides excellent repeatability. In addition, MRC 693 provides excellent uniformity, which is important in many applications. Its adjustable parameters and adjustable gas distribution equipment also make it easy to use in a range of different applications.