Used MRC 8620 #293605798 for sale

MRC 8620 is an advanced, high-performance sputtering equipment used for physical vapor deposition (PVD) applications in materials research, surface engineering, and a variety of other technical fields. The sputtering system features an 8-target, variable-angle, magnetron-based configuration that provides a wide range of process flexibility, including variable pressure, temperature, voltage, and current. The unit is constructed with a sturdy stainless steel chamber, vacuum operated gate and source. It also features a long-life diffusion pump with a cycle time of less than 3 minutes, and a turbomolecular roughing pump for rapid cycle time. High-precision temperature and gas controllers provide precise control of the temperature and pressure during deposition. An advanced control interface facilitates intuitive operation and can store up to 1000 recipes for easy process duplication. 8620 is able to deposit a wide variety of materials, including metals and alloys, oxides, nitrides, and polymers onto a broad range of substrates. It can precisely control film thickness, composition, and grain size for a variety of applications including sputtering targets, protective coatings (such as corrosion protection), anti-reflective coatings, transparent conductive oxides, and more. With high power sources, MRC 8620 is capable of providing high rate deposition. Each of the eight independent sources features an active magnetic field machine, which enables fast ramping and precise control of the process parameters. RF power is distributed up to 10kW with programmable frequency and modulations, while DC power can be supplied up to 3kW with the ability to adjust pulse timing and rise/fall times. An additional ion source can be incorporated for plasma activation. 8620 also offers a wide range of safety features, including an automatic shut-off in case of an emergency, door interlocking systems, auto-start based on a timer or schedule, and an RF power monitoring tool for fault detection. Additionally, the unit includes an exhaust asset for efficient handling of reactive gases and vapors. MRC 8620 is an advanced sputtering model that provides a wide range of PVD-related process capabilities, including high rate deposition, precise film thickness and composition control, and a wide range of safety features. With its reliable construction, intuitive control interface, and fast cycle time, 8620 is an ideal solution for applications in materials research, surface engineering, and other related technical fields.