Used MRC 8667 #293655700 for sale

MRC 8667 is a compact, RF magnetron sputtering equipment for production of precise film coatings. It is designed for operation in a direct-current (DC) powered environment and offers a wide range of features to enhance the quality and uniformity of applications. 8667 is suitable for a variety of types of applications, from general purpose thin-film coating, to specialized nanoscale deposition, and even advanced-coating applications such as those related to hard coatings and protective layers. It is designed to handle challenging substrates like diamond-like carbon (DLC) and costly low-k dielectric films. MRC 8667 consists of a process chamber with a sealed bell jar and a capability to support up to five different cathodes, along with an assortment of substrates and other necessary equipment. It has a maximum working pressure of up to 10 Torr and a base temperature of -10°C. The temperature is controlled by a PID controller and the process gases are introduced via mass flow controllers (MFCs). Additional features of the chamber include a quartz observation window, a flushing port and an electrostatic chuck chuck to hold the substrate during processing. The system also includes an integrated radio frequency (RF) power supply capable of sputtering up to 3 kW to provide uniform coating of higher quality over larger area substrates. The power supply also support the operating of different deposition processes with additional options such as magnetron rotation and pulse operation. Such options provide selectively adjustable power levels to create finer control of the film quality and structure. It also has a digital monitoring unit to monitor the process conditions and provide traceability of the parameters used for each coating job. 8667 also has advanced diagnostics capabilities, such as MRC Resolve™ measurement machine with in-situ diagnostics, which provides high accuracy measurements of films deposited while the process chamber is under operating conditions. This helps researchers measure substrates in real-time, whilst studying the deposition conditions and the properties of the film. Furthermore, this tool is also capable of controlling operation profiles and provides delay times between the different processing steps. MRC 8667 sputtering asset offers many advantages for production of thin-film coatings. It offers a compact and modular design for fast and efficient installation within a workflow. The model is easy to operate and has several options for controlling the process, resulting in films with high uniformity and quality. Additionally, it is valued for its traceability, on-board diagnostics and low contamination, making it suitable for a variety of applications.