Used MRC 8667 #9276506 for sale
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MRC 8667 is a state-of-the-art sputtering equipment used for material deposition and surface treatment. It is equipped with dual rotatable filter flux and modular power supply. It is mainly composed of a set of sputter sources, a vacuum pumping system, an evacuation and pressure measurement unit, and a machine controller. The sputter source consists of an arc chamber, a graphite holder, and an electrostatic grid. The arc chamber holds the sputtering targets and is sealed in an evacuated environment to ensure a consistently high vacuum. The graphite holder and the electrostatic grid significantly improve the uniformity and energy management of the arc chamber. The vacuum pumping tool ensures that the pressure is consistently low enough for sputtering and deposition to occur. It is composed of a series of pumps such as rotary vane pumps, scroll pumps, ion pumps, and turbo pumps. These pumps are connected in a series and provide appropriate evacuation parameters as needed. The evacuation and pressure measurement asset is used to accurately measure the pressure within the arc chamber and it adjusts the pumping model accordingly. The sputtering equipment is operated with a controller that manages all parameters such as target selection, current, temperature, and pressure. Parameters are set to ensure that the desired material gets deposited onto the substrate. The controller also monitors all the parameters continuously to guarantee a consistently high-quality process. The entire system is equipped with safety features like emergency shutdowns, current limitation, and hydraulic braking. 8667 is a versatile sputtering unit that is capable of depositing a wide variety of materials with high quality and precision. It has a broad range of functions and capabilities, making it suitable for a variety of applications from vacuum thin film deposition to semiconductor and electronics processing.
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