Used MRC 902 #293631817 for sale

MRC 902 is a sputtering equipment designed to deposit thin films onto substrates. It is capable of producing high-precision films with a great degree of uniformity and control. The system includes an ion source, vacuum vessel, power source and a sample holder. The ion source of 902 is a high-current, low-emission glow discharge (GD) source. This source is capable of producing a beam with a wide range of energy levels, allowing the user to tailor the energy of the beam to produce the desired film thickness, composition and morphological properties. The GD source also has an adjustable self-bias, allowing the user to control the ion current during the sputter process. The vacuum vessel in MRC 902 is a stainless steel chamber with a pressure-regulating unit. This ensures that deposition is performed in a controlled vacuum environment. The vessel is equipped with several inlet/outlet ports for the gases required for sputtering. These ports are designed for easy installation and maintenance. The power source for 902 is a high-voltage direct current (DC) generator. This generator is capable of producing currents between 0-250 A, allowing the user to tailor the output power for specific applications. The machine also includes an inductive eddy current monitor for constant monitoring of the substrate temperature. Finally, MRC 902 includes a high-precision sample holder. This holder allows the user to precisely terminate the substrate under vacuum, ensuring good performance during deposition. The sample holder can also be adjusted to control the angular position of the substrate and to accommodate various substrate sizes. In summary, 902 sputtering tool is capable of producing high-precision thin films with excellent uniformity and control. The asset includes an ion source, vacuum vessel, power source, sample holder and other features that enable the user to tailor the deposition process for specific applications.