Used MRC 902 #50686 for sale
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ID: 50686
Sputtering system
(2) Targets: ANGSTROM SCIENCES planar magnetron, 5x15"
(2) MFC's: UNIT
Controller: TECHWARE 68000
DC power supplies: ADVANCED ENERGY MDX-5
High uniformity shield (used for TaN sputtering): 1% across the pallet
MKS 270 and baratron
GP-303 IG controller
Flat screen monitor
Membrane keyboard.
MRC 902 is a state-of-the-art sputtering equipment designed for depositing materials for scientific research and industrial applications. It is equipped with a premium RF (Radio Frequency) source and DC (Direct Current) substrate bias controls, enabling greater precision and accuracy. With precise temperature control, the system can achieve precise deposition rates, allowing for precise deposition of various materials with different properties. 902 is configured with two cathodes: one main cathode capable of sputtering multiple target materials without re-adjustment of the cathode position, and a wide selection of single-material ancillary units. The ancillary units can be configured to accommodate various shapes and sizes of targets, enabling deposition across an array of substrates. Furthermore, the unit includes a sophisticated EUV (Extreme Ultraviolet) component which is used to create higher purity materials in layers as thin as 10 Angstroms. MRC 902 is equipped with an ultra-stable RF power delivery machine and a robust capability for controlling power flow which allows for precise and consistent material deposition rates and deposition thickness. In addition, the RF power tool enables the asset to sputter multiple materials in different combinations for highly-tailored applications. The sputtering process can be held to tight process tolerances through the use of an advanced closed-loop temperature control which helps ensure uniform layer thickness. The model includes an integrated exhaust and purification equipment which can precisely adjust the oxygen concentration in the chamber, which ensures the highest quality deposits. 902 sports a host of other features that make it an ideal sputtering system for virtually any application. It offers a user-friendly touch-screen interface that is simple to adjust and monitor. The instrument also offers high-precision measurement capabilities for monitoring and reporting process parameters. Lastly, tools for capturing high-resolution images of the deposition process are included for visual monitoring. Overall, MRC 902 is a highly capable sputtering unit which offers unparalleled performance and repeatability for research and industrial users. It is designed to handle a wide range of materials and substrates and can enable highly accurate and precise deposition.
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