Used MRC 902 #9286004 for sale

MRC 902 sputtering equipment is an advanced deposition tool designed for semiconductor materials processing and research applications. It is used to create thin films on substrates by bombarding the target material with energetic ions created by electrical discharges. Sputtering works by first creating a plasma of gaseous ions in a vacuum chamber by inducing an electrical current. Then, the target material is sputtered from the target source onto the substrate as a thin deposit. 902 sputtering system provides precise control over the deposition process, allowing for the creation of precise thin films with uniform thickness. This unit has a wide variety of features, including a 22 target source configuration, multiple sputtering sources and sputtering sources with variable current density. This machine also has a 5-axis robotic arm for source manipulation and precise target positioning. It is capable of achieving highly uniform layer full coverage over large area substrates. MRC 902 also has a sophisticated process control tool for real-time monitoring of the deposition process, with adjustable parameters to optimize film properties. These parameters include pressure, vacuum level, temperature, process gas flows, source composition and power level, as well as target-to-substrate distance. The asset is also equipped with an intuitive user interface for efficient operation. 902 sputtering model is a reliable and versatile solution for manufacturing and research applications. It produces uniform thin films with precise control, providing manufacturers with superior substrates suitable for advanced device applications. Because of its numerous features and user-friendly interface, it is one of the most popular systems on the market for material deposition and research.