Used MRC 902 #9400745 for sale

Manufacturer
MRC
Model
902
ID: 9400745
In-line sputtering system Missing parts: Elevator pallet stand Pallet carrier Chamber shields (2) Cathodes DC Power supply Convectron gauges for foreline and chamber Miscellaneous port adapters and switches.
MRC 902 sputtering equipment can be used in a variety of research applications which require the deposition of thin films and nanometer-level coating layers. It is a large-area substrate deposition system which is capable of processing small and large substrates up to a maximum size of 600x600mm. 902 has an environment blanketed chamber; the interior is lined with an air-muffling double-layer construction, for maximum acoustic reduction and vibration elimination during sputtering. Additionally, all chamber hardware is sealed as a complete assembly and is further protected by an all-round safety door. MRC 902 features adjustable planar magnetic and RF internal coils, which provides superior sputtering uniformity and quality layer deposition. The sputtering target is positioned in the center of the plate rotation axis and is surrounded by argon gas, which enables a number of reactive sputtering processes. 902 also features a wide variety of sputtering selected cathodes with replaceable segments and adjustable support rods, allowing for customizable curves and deposition profiles. MRC 902 is also equipped with Automatic Batch Interface, which allows users to easily program the deposition parameters. Additionally, it enables computer-controlled recipes, which can be repeated to yield consistent and reproducible results. The ABF also includes a built-in timer, allowing for precise times and accurate gas flow control, allowing for precise control of deposition conditions. 902 offers an externally-controlled scanning multiple-axis movement and substrate spinner, to ensure precise substrate deposition. It is also equipped with a post-deposition source evacuation unit, with a customizable evacuation time that can be altered to suit different substrates and films. In conclusion, MRC 902 is an advanced sputtering machine that can be used to deposit high quality films and layers onto both small and large substrates. It is reliable and efficient and offers precise control over deposition parameters and substrate positioning. 902 provides excellent sputtering uniformity, acoustics, vibration reduction, and is extremely easy to operate.
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