Used MRC 903 series #85308 for sale

MRC 903 series
Manufacturer
MRC
Model
903 series
ID: 85308
Wafer Size: 12"
Vertical / downward sputtering system, 12" Includes: Chamber, load-lock and chassis Cryo pump, helium lines and compressor Rough pump Hydraulic pump Siemens/Omron PLC system with Siemens HMI Computer system, wiring, pneumatics Motor drive system Safety interlock and emergency stop system conforming to current EU SEMI standards 10K DC power supply Full set of documentation containing electrical drawings, user and maintenance manuals (2) cathodes without material (dep material unknown) Control system capable of storing 256 multi-step user selectable recipes, automatic pump-down and cryo regeneration routines.
MRC 903 series sputtering equipment is a production-level tool used to deposit thin films of various materials onto a substrate. It is designed to enable accurate and repeatable thin-film deposition across large production runs. The system utilizes DC, RF and pulsed DC power supplies to achieve multiple technology options for sputter deposition. MRC 903 is an advanced physical vapor deposition unit that is capable of depositing 100nm-500nm thin films over large substrates and large production runs. The machine includes a rotational target assembly that allows for a variety of materials to be sputtered, as well as options for both DC and RF magnetron sputtering. The DC power supplies are variable up to 500 volts and the RF power supplies are variable up to 500 watts. The tool has a number of process control features that enable precise control over the deposition process. These features include a computer-controlled variable pressure chamber, a multizone temperature controller, and an advanced process monitoring and control asset. The user-friendly interface also provides advanced programming options that allows complex recipes to be developed, stored, and recalled at will. MRC 903 sputtering model has an active view chamber that enables in-situ viewing of the deposition process, which allows for the real-time optimization of conditions to achieve the desired thin-film results. Additionally, the model can be integrated with an automated source-to-sample transport equipment, enabling fast, efficient and repeatable deposition of thin films across large substrates. Overall, 903 series sputtering system is a reliable and advanced production solution for thin-film deposition. With its high-performance sputtering capabilities, advanced features, and flexibility for both large and small production runs, the unit offers an efficient and effective solution for thin-film deposition.
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