Used MRC 903 #9199289 for sale

MRC 903 is an advanced tabletop sputtering equipment that provides high quality thin film deposition with reliable process repeatability. It is a high speed, full featured sputtering system that produces thin film layers for applications including optical coatings, MEMS, optoelectronics, MEMS and ASICs devices. 903 is a three-axis sputtering unit with a graphite source and a rotatable substrate holder. It has a shielded 5kV transistor sputter gun and a gas box with up to eight gas lines and two valve vacuum valves. It features a high energy electron gun for sputtering and an electron gun assembly with a planar target. MRC 903 also provides a variety of auxiliary sources such as ion sources, argon plasma sources, radio frequency, and microwave generators. 903 has a unique three-level unitized deposition chamber that simultaneously allows sputtering and evaporation of multiple targets with separate power supplies and chamber conditions. It has an excellent deposition chamber uniformity with a broad range of deposition parameters, including chamber pressure, temperature, and gas and ionization levels. MRC 903's user interface is exceptionally customizable allowing for precise control of sputtering processing. 903 is built with pneumatically-actuated, motorized linear stages that allow precise movement and positioning of the target and the substrate. It has a dual-sided platen that provides a stable, resourceful magnetic field to keep the target and substrate in place. MRC 903's surface magnet plates can also be used for controlling the angular position of the rotatable substrate holder. 903's design also provides a convenient protection for the substrate holder and target, making it a safe and reliable choice for thin film deposition. It contains all elements needed for high quality thin film deposition, including the evaporative source, the platen, and the substrate and graphite sources. In summary, MRC 903 is a reliable tabletop sputtering machine that can provide high quality and repeatable thin film deposition for a variety of semiconductor technologies. It is a resourceful and customizable device with many features to ensure efficient and effective thin film deposition. Its excellent design features and ease of use make it an ideal solution for researchers requiring precision-controlled sputtering operations.