Used MRC 903 #9241895 for sale

MRC 903 is a sputtering equipment developed by Advanced Energy. It is a high-performing system commonly used in physical vapor deposition (PVD) processes. It is designed to facilitate precise coating and thin-film deposition. 903 features a single-chamber design. The chamber is constructed from aluminum, and is powered by a high-precision fixed-magnetron DC or RF power supply. The power supply is digitally controlled and can deliver from 20W to 40 kW of power. The unit is capable of precision coating and thin-film deposition with a wide variety of materials, including metals, dielectrics, organic compounds, and rare earths. The sputtering machine has various adjustable parameters, such as gas pressure, pressure and temperature control, target material and handling, and bias voltage, for an even film thickness and uniform deposition. The tool is also equipped with a multi-zone substrate substrate heater capable of reaching up to 300 °C. This enables the asset to operate under different temperatures, allowing deeper penetration into the substrate. MRC 903's precision control of target material and handling is made possible with the Dual Source Mechanism (DSM). It is designed to facilitate high-rate deposition of thick film variations across a wide substrate area. This is achieved by enabling multiple independent sources to be deployed, and individual sources can be moved along three axes. 903 also offers a uniquely uniform deposition across a wide substrate with the Focused Diode Construction. It features a unique 3 axis mapping model for better deposition proficiency throughout its operating range. This is extremely useful for precision coating tasks into deep-trenches or deices with fine line features. The equipment also features an advanced Substrate Target Positioning System (STPS) to ensure even deposition on multiple substrates. This adjustable arm unit allows for precise adjustment and is designed for applications requiring substrates to be mounted by the four corners. MRC 903 is an efficient, reliable, and user-friendly sputtering machine, ideal for a variety of applications. It is a powerful tool capable of precise coating and thin-film deposition, and it provides superior film uniformity and repeatability across a wide substrate area.