Used MRC 903 #9388420 for sale

MRC 903 is a RF magnetron sputtering equipment used for Research and Development, as well as industrial work. The sputtering system features an open chamber, allowing for easy access to target materials, and an open source, allowing for precise control over target material selection. It is equipped with a 30 kV dc source, capable of delivering a maximum beam current of 10 mA, as well as an ion gun option for additional sputter etching control. The unit also features a unique low-pressure vacuum, allowing for precise gas delivery and a stable target surface. 903 is capable of precise sputter rates and uniformity, meaning the target material's surface can be manipulated to achieve precise results. The machine is capable of producing a wide range of material choices, including metals, insulators, and semiconductors. MRC 903 is popular for its ease of use and user-friendly design. The tool includes a user-friendly interface, with adjustable sputter and etch rates, allowing users to quickly and easily customize their deposition rates. Additionally, the asset includes detailed and comprehensive reports, which allow users to track the progress of their sputtering work. 903 features a large magnetron, ensuring a wide range of sputtering options and depositions. Its large 25 cm diameter vacuum chamber also allows for large sputtering targets, meaning the model can accommodate larger substrates, as well as multiple samples. Furthermore, the equipment is compatible with multiple processes, meaning users can perform ion etching and sputtering. MRC 903 is an ideal tool for R&D laboratories and industrial processes. Its large chamber size, precise sputter rates and comprehensive reports make it an excellent choice for creating consistent, high-quality samples. Its user-friendly and customizable interface makes it easy to use and adjust parameters, reducing the time and effort involved in getting results. Its reliable engine and top-of-the-line source ensure consistent results and maximum output.