Used MRC 903A #9038716 for sale

MRC 903A is a kind of sputtering equipment, designed for the deposition of thin films onto substrates for thin-film applications. It has a high-throughput design with a multifunctional base unit, which contains a rotatable sputter head, and a high-power RF and DC power supply. The RF power supply is used to drive the RF magnetron sputtering gun, and the DC power supply is used to drive the dense plasma focus target. The sputter head is adjustable in both the X-Y-Z directions, providing excellent uniformity over large areas. This system uses a dual-source vacuum chamber for simultaneous sputtering with two materials. The dual-source chamber has two independent chambers, each containing its own rotatable sputter head. A sample loadlock chamber is included for loading and unloading of substrates. 903A also has an optional Langmuir-Blodgett trough that can be used to deposit ordered molecular arrays. MRC 903A is equipped with a wide range of process monitoring and control features. A gas flow computer is used to regulate process pressures, and to monitor the ratio of sputtered material to Ar +. The unit is also equipped with a mass spectrometer, for monitoring process gases such as O2 and N2, and a crystal oscillator for measuring RF power output. A Peltier element is also included for precise temperature control of the sample. 903A is a powerful, versatile sputter machine that can be used for the deposition of metal, nitride and oxide thin films. It is a high-throughput tool with excellent uniformity, highly repeatable and reliable process control, and dedicated monitoring for safety and process control. With the optional Langmuir-Blodgett trough, it is ideal for a wide range of dielectric, semiconductor and ferromagnetic materials.