Used MRC 903M #126500 for sale

MRC 903M is a type of sputtering equipment that is used to deposit thin films of materials onto substrates. It is a vacuum coating system that utilizes a magnetically-enhanced reactive sputtering technique to deposit thin films. This unit is capable of providing high-rate, uniform thin films with process control options that enable extremely high quality coatings. Unlike other deposition techniques, MRC 903 M sputtering machine utilizes a series of magnetic fields to enhance the energy of the sputtering gases, allowing for rapid deposition of a wide range of materials. 903M uses a vacuum chamber which contains a substrate table and a set of platters which house the target material for the sputtering process. These platters are connected to power supplies with variable settings, allowing for precise control over the deposition rate and thickness of the thin film. Inside the chamber, the substrate table is surrounded by an array of magnetron sputtering guns, which allow the gases to react with the target. As the sputtering gas is injected into the vacuum chamber, the electrons are accelerated by the magnetic fields to create a high energy ionic or particle beam that bombards the target surface, depositing the material onto the substrate. 903 M sputtering tool has proven to be a valuable tool in the research and development of thin films, allowing a range of materials and substrate surfaces to be coated. The range of applications of MRC 903M includes a variety of high temperature and wear resistant materials, including precious metal and ceramic thin films. The asset has also been used to deposit insulation films used in the microelectronics industry. MRC 903 M systems are modular and can be tailored to a range of requirements, ensuring quality and cost-effective production. The standard version of the model that comes equipped with 903M is capable of providing uniform films with excellent uniformity and reproducibility, allowing for high quality thin films to be deposited. The flexibility of 903 M enables a wide range of parameters to be adjusted and fine-tuned during deposition, including the beam energy or voltage, current, number of targets, deposition rate, deposition time, and target material. The equipment ensures repeatability and accuracy of the thin film deposition, providing exceptionally high-quality coatings. Overall, MRC 903M sputtering system is an invaluable tool for thin film deposition, enabling a range of materials to be deposited with high precision. The unit's magnetic enhancement of sputtering gases allows for rapid deposition of a wide range of materials, and its ability to provide high-quality thin films with excellent uniformity and reproducibility makes it an ideal choice for research and development of thin films.