Used MRC 943 #293703391 for sale
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ID: 293703391
Sputtering system
Qty / Make / Model / Description
(4) / Granville Phillips / 316 / Vacuum gauge controller
(2) / Varian / 880RS / Vacuum ionization gauge
(10) / SELAC / XT206 / Timer
(2) / MKS / Analog Type 260 / Gas needle valve
(2) / MKS / Display Type 261 / MAS Flow meter
(2) / Varian / - / Diffusion pump
(5) / Assembled / Assembled / Target gun
(1) / ZLX Tech / - / Sputtering target -Titanium
(1) / ZLX Tech / - / Sputtering target -Iron
(1) / ZLX Tech / - / Sputtering target -Cobalt
(1) / ZLX Tech / - / Sputtering target - Chromium
(1) / ZLX Tech / - / Sputtering target - Aluminium
(1) / Advance Energy / MDX-1K / RF Generator
(1) / Advance Energy / MDX-5K / RF Generator
(2) / Assembled / Assembled / Vacuum chamber
(2) / ADWARDES / 40-2Satges / Vacuum pump, (40-2 Satges)
(1) / Assembled / Assembled / Step down stablizer, (110-3 Phase)
(2) / Assembled / Assembled / Electric panel.
MRC 943 is a type of sputtering equipment manufactured by Materials Research Corporation. It is a multiple-source system, meaning it has the capability to deposit several different types of thin films onto substrates. 943 utilizes magnetron sputtering processes to deposit coatings onto the substrate. MRC 943 has an 18 inch, six-station sputtering chamber which is designed to accommodate multiple sputter guns. The chamber is outfitted with a high-vacuum unit with a base pressure of 10-4 millitorr. With a powerful turbomolecular pump and a programmable gas control machine, the chamber can reach a pressure of 10-6 millitorr. The radio frequency (RF) power supply provides 20 watts of power for each of the six sputter guns, allowing for closely controlled thin film deposition. The sputtering guns are equipped with tungsten, tantalum or other inert non-destructive sputtering targets. The coating to be deposited can be deposited in a single process, or multiple targets can be used to create multi-layer coatings with different properties. The linear robot arm of 943 allows for full automation of the coating process and is capable of sputter coating the entire substrate in one run. In addition to sputtering, MRC 943 can also be used for annealing and engraving applications. The annealing process enables radiative annealing, enabling homogeneous annealing of thin films deposited on the substrate. The engraving process is used to create narrow grooves on the substrate for integrated circuits. 943 also features a programmable controller with a large color monitor and intuitive programmable logic controller (PLC). With its powerful built-in automation control tool, MRC 943 can be controlled and monitored for seamless, automated deposition of thin films. 943 is an advanced and reliable sputtering asset, capable of depositing thin films with ultimate precision. With its multiple-source capability, it offers a broad range of capabilities to suit different application requirements. All in all, MRC 943 is an ideal sputtering model, offering unparalleled performance and reliability.
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