Used MRC 943 #293749818 for sale

Manufacturer
MRC
Model
943
ID: 293749818
Vintage: 1980
In-Line DC Magnetron sputtering system Position: 3-Target RF Cathode system EDWARDS / CTI CRYOGENICS Cryo-Torr Pump, 8" LEYBOLD D30A Rotary vane pump LEYBOLD WSU-151 Roots blower EDWARDS / CTI 9600 Compressor Does not include targets Manuals Baratron gauge non-functional Missing parts: Load lock cryopump Transport scan motor 1980 vintage.
MRC 943 is a DC/RF sputtering equipment that is used to produce thin films on substrates in scientific laboratories. It is suitable for coating materials of varying thicknesses with a deposition rate range of 0.002 to 10 nm/s. The system consists of a deposition chamber, an RF/DC power supply, an auxiliary gas supply unit, and a vacuum machine. The deposition chamber features a vertically mounted magnetron target up to 10 inches in diameter and an integrated counter electrode. It is connected to a vacuum tool that includes a mechanical and oil-sealed pump, a dry booster pump, and a turbo molecular pump for high-vacuum operation. Additionally, the asset features an auxiliary gas-delivery model which is used for sputtering process control and precursor delivery. The RF/DC power supply provides up to 300W of power for uniform film deposition and it can also be used to compensate for target erosion. The equipment is highly customizable and it can be used with various reaction gases and precursors. It is equipped with a microprocessor-based controller with multiple-zone monitoring capability. It is capable of manual or automatic operation and has advanced health diagnostics and safety features. Additionally, it supports remote communication functions, allowing the system to be monitored and controlled remotely and providing users with more flexibility and convenience. In brief, 943 is a reliable and high-performance sputtering unit which is suitable for various thin-film applications.
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