Used MRC 943 #9199304 for sale

MRC 943 is a sputter deposition equipment used for the application of thin films. It is a fully automated system that is capable of sputter deposition of single- or multi-layer thin films within a vacuum chamber. 943 is equipped with three 12-inch diameter magnetron sources, providing a deposition area of 24.4 square inches. The chamber can accommodate up to 28 substrates, or 25 wafers, on each run. MRC 943 has an integrated closed loop process control unit that includes a rotating magnetron facility. This enables the growth of uniform films over each substrate. The machine also features a reel-to-reel tool, which enables the use of continuous sputter targets and provides for the deposition of multiple thin films without tool change. The rotating magnetron facility also enables the manual control of individual targets, which allows for the optimization of film properties such as thickness and uniformity. The asset also includes software for target selection, substrate heating, and bias. 943 has a vacuum chamber with a base pressure of 10-6 Torr and a dynamic pressure range of 10-3 to 10-6 Torr. Additionally, a 3-stage ion pump is incorporated to ensure high vacuum and low background deposition. The model also includes an automatic substrate handling equipment which makes it possible to automatically load and unload substrates without breaking the chamber's vacuum. The Substrate Handling Cart is equipped with multiple lift feeds that ensure efficient substrate processing of up to 30 wafers at once. The system is computer controlled, with an easy to use Graphical User Interface (GUI) that allows the user to customize various deposition parameters such as power, targets, and substrate temperature. In addition, the unit can be monitored via RS-232 or GPIB interfaces. Overall, MRC 943 is a versatile and powerful sputter deposition machine for a variety of thin films. The open chamber design and automated substrate handling allow users to quickly and efficiently processes lots of substrates. And with the flexibility to adjust targets and substrate temperatures, the films produced exhibit excellent uniformity and repeatability. 943 is a great choice for universities, research institutions, and industrial labs who require a reliable, high-performance sputtering tool.