Used MRC Eclipse #9144009 for sale

MRC Eclipse is a sputtering equipment that is widely used across various industries, including semiconductor, coated optics, and nanotechnology. It employs Plasma Activated Deposition (PAD) technology to control the kinetic energy of the sputtering particles, ensuring superior coating properties and greater process stability. The PAD Technology allows for higher throughput, improved uniformity, and superior adhesion of the deposited films. Eclipse utilizes a combination of improved design and proprietary technology to achieve a superior sputtering process. It features a pair of motion stages, each of which is equipped with a pair of PC-based process controllers. The controllers are equipped with powerful and forward-thinking software, allowing for the precise control of the sputter process. The advanced algorithm compensates for the various non-linear phenomena that can occur during the sputtering process. Additionally, the software allows for simple recipe-based processing with automatic, batch processing features. The vacuum chamber in MRC Eclipse is dual-wall insulation, allowing for increased thermal stability. It also features an optimized design that reduces operating costs and helps to minimize gas consumption. The chamber also has a dedicated antechamber, allowing for rapid chamber throughput. Eclipse also includes several unique features that allow for enhanced tool performance. A high-rate pressure sensor and feedback chip constantly monitors and compensates for pressure performance, ensuring optimum process stability and reliability. Additionally, the system includes a reliable deposition monitor that continuously tracks unit performance and provides valuable information for process optimization and process tracking. All of these features make MRC Eclipse a reliable and cost-effective sputtering machine that is capable of providing superior quality and performance. It is widely used across a variety of industries for applications such as masking, patterning, and etching, and its superior technology and reliable performance make it an ideal choice for high precision sputtering processes.