Used MRC Eclipse #9144779 for sale

MRC Eclipse
Manufacturer
MRC
Model
Eclipse
ID: 9144779
Wafer Size: 6"
Sputtering system, 6".
MRC Eclipse is an advanced sputtering equipment designed for a wide range of applications. It combines unique features that allow precise sputter-controlled processing in various substrate orientations, and it is suitable for high-precision coating deposition of thin films. Eclipse is able to deliver very high powers of up to 1000 W, allowing for ultra-high-rate deposition of metal. It also includes capability for reactive sputtering, enabling depositing of advanced materials, such as metal oxides and nitrides. The system is comprised of an electrical energy source, a gas control unit, a vacuum chamber, and power supply. The energy source is an electron beam source capable of providing high powers and excellent control, while the gas control machine allows for the delivery of inert and reactive gases. The vacuum chamber is designed with hardened stainless steel walls, utilizing advanced thermal management systems for fast and efficient processing. MRC Eclipse offers several advantages when compared to conventional sputtering systems. It offers high-rate deposition with outstanding film adhesion properties, as well as precise control of target erosion and process uniformity. It also enables reactive sputtering, allowing for the deposition of advanced materials. Additionally, it offers high deposition rates and good film properties at extreme temperatures. Eclipse is designed for use in a variety of industries, and is capable of providing fast and efficient production with extremely high-quality results. Its ability to deliver highly uniform coatings, as well as its precision and flexibility, make MRC Eclipse an ideal solution for a variety of different needs.
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