Used MRC Eclipse #9296418 for sale

MRC Eclipse is a sputtering equipment designed for the deposition of thin films. It uses the physical sputter deposition method to deposit a thin film on substrates. The system is designed with a vacuum chamber that is a sealed chamber to control the quality of the sputtered film. The chamber has several ports and valves which allow the operator to control the flow of the sputtering gas. The process of sputtering is initiated when a target, which is typically a metal plate, is placed in the vacuum chamber and is exposed to an external source of energy, such as radio-frequency or direct current. When the target is bombarded with energetic particles, atoms of the target material are ejected and travel onto the substrate, where they form a thin film. Eclipse is a highly configurable unit, which allows operators to accurately control the quality of thin film. It can be set up for a range of sputtering processes, such as planar, magnetron and hybrid sputtering, as well as reactive sputtering. The machine can also be configured with multiple targets and sub-targets. This allows for an enhanced deposition result with layers of different materials for advanced film stacks. The tool is designed with a controller, which allows the operator to closely monitor the process. This controller can regulate the chamber pressure, gas flows, deposition rate, arc erosion and power levels. It also allows for the user to program a range of recipes for different deposition processes. This controller also enables the user to store and recall recipes easily, which streamlines depositions. Overall, MRC Eclipse is a reliable and highly customizable sputtering asset. It allows operators to accurately deposit thin films on substrates with reliable deposition properties. It also offers a range of process recipes that can be easily selected and saved. This ensures the process efficiency and high level of performance.