Used MRC / MATERIALS RESEARCH CORPORATION Eclipse Mark II #9300202 for sale

MRC / MATERIALS RESEARCH CORPORATION Eclipse Mark II
ID: 9300202
Wafer Size: 6"
Systems, 6".
MRC / MATERIALS RESEARCH CORPORATION Eclipse Mark II is a sputtering system that allows for the deposition of thin films on wafers at a very precise rate. It consists of a base with a chamber and a few critical components. This base contains an RF power supply, an RF heating element, a cryopump, and a mass flow controller. The chamber contains a deposition substrate holder, coil/sample/mass flow controllers, and a shutter. The vacuum chamber has a turbo-molecular vacuum pump and a rotary vacuum feed-through to achieve deep vacuum that is necessary to perform effective sputtering. The RF heating element is used to maintain a constant temperature and the cryopump is used to achieve a lower pressure and temperature in the chamber. The process of sputtering starts by placing a material to sputter on the target and then introducing a rare gas, usually Ar and Xe, into the chamber and creating a plasma. The plasma bombards the target material, which desorbs atoms from the target and these atoms are then deposited on the substrate creating a thin film. During the deposition, the shutter is kept closed to isolate the chamber from outside environment, and to ensure that only the desired material is sputtered. The RF power maintains a constant temperature, so that the sputter process is highly precise and repeatable. The mass flow controller ensures that the flow of the sputtering gas and the temperature in the chamber are consistent and precise. The coil/sample/mass flow controllers provide stability and consistency to the sputtering process by measuring the sample pressure, constantly monitoring the process and regulating it to achieve the desired thin film. By utilizing all of these components together, the Mark II provides a precise and repeatable thin film deposition. Additionally, the Mark II provides a wide range of control options and automated processes that allows the user to easily adjust most of the parameters, monitor the process and adjust it during the deposition process. This automated feature allows the materials researcher to focus on more important details of their experiment and the thin film deposition. The Mark II is highly reliable and precise thin film deposition system. It is ideal for labs that need to accurately deposit thin films for advanced materials research. By combining the RF power supply, RF heating elements, cryopump, mass flow controller, and the shutter, it is able to give precise and repeatable thin film deposition ideal for advanced materials research.
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