Used MRC / MATERIALS RESEARCH CORPORATION Eclipse #9226263 for sale

MRC / MATERIALS RESEARCH CORPORATION Eclipse
ID: 9226263
Wafer Size: 6"
Vintage: 1997
Sputtering system, 6" 1997 vintage.
MRC / MATERIALS RESEARCH CORPORATION Eclipse is a flexible sputtering equipment that is designed for deposition of thin films onto substrates. It utilizes RF power sources for both sputtering and deposition processes and is especially well-suited for deposition of metals, dielectrics, and semiconductors. MRC Eclipse system includes a main deposition chamber and a loadlock unit that encloses sample substrates. The deposition chamber contains a variety of components, including a low-noise RF generator, plasma sources, cooling coils, and a gas injection unit. The loadlock unit is designed to reduce contamination and contains two stations and a shuttling mechanism to transfer substrates between the loadlock and deposition chamber. MATERIALS RESEARCH CORPORATION Eclipse machine is designed for high deposition rate with high-quality thin films. The RF RF home generator produces magnetron-generated power and produces a controlled atmosphere inside the chamber. A variety of sputter sources including low-emission and high-emission sources are used in the deposition process. These sputter sources are routinely operated with argon and other reactive or inert gases such as nitrogen and oxygen. By utilizing these sources, films of different densities, conductivities and other properties can be produced. For other processes, Eclipse tool is equipped with a range of ancillary components. These components include a shuttle chamber, forward magnetron coil, a mass flow controller, glow discharge source, and a plasma generator. All of these components are designed to work with each other in order to optimize process conditions and minimize contamination. MRC / MATERIALS RESEARCH CORPORATION Eclipse asset is also equipped with an integrated safety model. This equipment monitors various parameters such as temperature, pressure, process gas supply and chamber conditions. In addition, MRC Eclipse system allows users to customize settings to ensure optimal performance. This includes the ability to select a desired rate of film deposition and particle size, as well as the ability to modify the sputter sources and other components when necessary. MATERIALS RESEARCH CORPORATION Eclipse unit is highly advanced and is suitable for a variety of applications. It is reliable and easy to use, making it an ideal choice for research labs and production environments. Its flexible, user-friendly design makes it a great choice for both deposition and sputtering processes.
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