Used MRC / MATERIALS RESEARCH CORPORATION Eclipse #9238094 for sale

MRC / MATERIALS RESEARCH CORPORATION Eclipse
ID: 9238094
Wafer Size: 8"
Sputtering system, 8".
MRC / MATERIALS RESEARCH CORPORATION Eclipse is a versatile sputtering equipment used for a variety of thin film applications, including semiconductor and dielectric device fabrication. It features a unique dual-gun design, which utilizes two independently controlled electron guns in the same sputtering chamber to enable high-precision and highly reproducible deposition of multiple film materials in one process run. The electron guns are located at opposite ends of the chamber and the power features of MRC Eclipse can be precisely controlled with two integrated power supplies that allow for fine-tuning of the deposition rate of each target material and deposition rate ratios between material layers. MATERIALS RESEARCH CORPORATION Eclipse also features a precise deposition control system with a patented linear motion feeder unit, which provides excellent uniformity across the substrate for single-layer or multiple-layer applications. The machine includes multiple film deposition technologies, such as magnetron sputtering, low-temperature deuterium plasma deposition, and also allows for high-power pulsed plasma deposition with a high-resolution rotating target. The rotating target enables improved uniformity of the film on large-area substrates, while the plasma-pulse frequency brings about higher deposition rates and improved process repeatability. Additionally, a hemispherical source option offers an extra layer of versatility to Eclipse's capabilities, allowing for substrate-specific custom sputtering processes. The versatility of MRC / MATERIALS RESEARCH CORPORATION Eclipse is further enhanced by its ability to accommodate a broad range of substrates, targets, and equipment components, as well as its compatibility with process tools from major thin film equipment manufacturers. MRC Eclipse also offers a wide range of automation capabilities for improved process reliability and control. The process interface includes manual and programmable modes, full process automation through scripting, and a user-friendly graphical interface for easy recipe setup and control. With all its features combined, MATERIALS RESEARCH CORPORATION Eclipse offers unparalleled sputtering capabilities for highly precision device fabrication.
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