Used MRC Redux #293652074 for sale

MRC Redux is a sputtering system used in modern industrial and research settings to deposit thin layers of material onto substrates. It works by creating a plasma within an evacuated chamber and using it to bombard the target material, causing them to become sputtered and then deposit them onto the substrate. This process is very precise, as the thickness of the layers can be accurately controlled. At the heart of Redux is a vacuum chamber that contains a process gas, such as argon, xenon or nitrogen. This allows for a stable environment for the process to take place. Above the vacuum chamber is a sputter target, which is the material which will be used for the thin layers. The target is placed to face the substrate, which is the material upon which the coating will be applied. To facilitate the sputtering process, an electric field is generated using a magnetron head. This electric field causes electrons to be emitted from the process gas, creating a plasma atmosphere within the chamber. Within this plasma, the positive ions of the process gas travel in the direction of the sputter target, bombarding it and causing the release of smaller atoms of the material. Negative ions in the plasma are attracted to the substrate material, and it is this combination of positive ions and negative ions that enables the coating to be applied to the substrate material. The discharge of the magnetron is typically below 500W, however this can be adjusted as required depending on the specific process. The amount of material removed from the target can be controlled by adjusting the gas flow, pressure and discharge power of the magnetron. This allows for a greater degree of accuracy regarding the thickness of the material that is applied to the substrate. Additionally, the plasma can be varied to produce different emission spectra to alter the features of the coating. Overall, MRC Redux is chosen due to its flexibility, accuracy and reliability when it comes to coating material with thin layers. The process produces a clean, uniform layer that is ideal for many industrial and research applications.