Used MRC / TEL / TOKYO ELECTRON Eclipse Mark IV #9288402 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9288402
Wafer Size: 4"-6"
PVD System, 4"-6"
Controller upgraded
Power supply: 10 kW
(3) PVD chambers
(1) Etch chamber
Ultra high vacuum system
Atmospheric wafer handler
Electronics and control system
Wafer standard: SEMI
Wafer handling: Standard wafer handling of fragile wafers
Chamber 1:
ICP
Power supply: RF Generator
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Backplane: Non-contact single zone
Chamber 2:
Titanium Nitride (Ti/TiN)
Process kit type: TiN (RMX-10)
Target type: Solder Bnd
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 3
T/S Spacing, 2.5"
Ar Entry: Door injection
Regas type: N2/1000 sccm
Shield type: (2) Shields
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 3:
Aluminium (AlCu)
Process kit type: Al (SPA-10)
Target type: Single piece
Cathode type: SPA-10
Power supply: 20 kW
Tap setting: 2
T/S Spacing, 2.0"
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 4:
Molybdenum (Mo)
Process kit type: Mo (RMX-10)
Target type: Solder bond
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 2
T/S Spacing, 2.5"
Ar Entry: Door injection
Shield type: (2) Shield s
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Standard chamber configuration:
8F Cryo pump
MKS Mass flow controllers
RGA Valve set: V4 Conflat
(3) Position gate valves
Non-contact backplane heaters
Frontplane: S/F Vent
Pod shields
Mainframe options:
Wafer holders with ceramic latches
Edge exclusion: 1.5 mm
Laminar blowers
Filters
SECS/GEM Communication
Wafer mapping control
Clamp rings:
Full face
Stainless steel
Facilities options:
Line frequency: 208 V
Line voltage: 60 Hz
Power rack cable length: 30 ft
Cryo compressor lines: 30 ft
Bottom feed utility lines
Other options:
Manuals
OEM Controller
Alignment tools
System shields: ICP, Ti, AICu, Mo
(5) Clamp ring wafer holder assemblies
Bell jar assemble.
MRC / TEL / TOKYO ELECTRON Eclipse Mark IV is a fully automated sputtering equipment used in materials sciences. It is designed for in situ applications including thin-film deposition, surface modification, and nano-architecture fabrication. This system is equipped with an advanced sputtering gun that allows precise control over the deposition rate, profile, and thickness of films. It is also capable of multiple process sections, which allows for the parallel deposition of different materials on different areas of the substrate. MRC Eclipse Mark IV utilizes a high power RF/DC power supply with a frequency range from 0 to 13.56 MHz. The unit has an available power range of 1 to 1,500 W. The multiple sputtering zones allow for deposition on different parts of the substrate with different fluxes for each zone. The sputtering gun utilizes a cylindrical magnetron source and is equipped with a collision shield to prevent the accumulation of ions around the source. A load-lock unit is for substrate transfer and allows for rapid processing of large substrates. The machine is programmed with a precision programmable logic controller (PLC) to control the motion and operation of the sputtering gun. The PLC can be programmed to optimize process control and gives the user an efficient platform to rapidly acquire the desired film characteristics. Additionally, the tool features a vacuum chamber with a roughing and a turbo molecular pump that allows for ultra-high vacuum and easy operation. TEL Eclipse Mark IV also has advanced hardware with advanced monitoring and control systems. These systems are able to monitor the pressure, temperature, and power of the deposition process in real-time. This allows for precise control of the deposition parameters to provide a repeatable process and a reliable film. The asset also features a touch-screen user interface which allow for intuitive operation and control of the model. Overall, Eclipse Mark IV is a state-of-the-art sputtering equipment designed for a wide range of thin-film deposition applications. It has highly precise motion control systems, advanced monitoring and control systems, and a user-friendly interface, which makes it ideal for research and development of thin-film materials.
There are no reviews yet