Used MRC / TEL / TOKYO ELECTRON Eclipse Star #9112093 for sale
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ID: 9112093
Vintage: 1999
RMX Magnet Assembly Target Gun, P/N: A119124
Oriental Motor P/N: 51K40GN-AW
1999 vintage.
MRC / TEL / TOKYO ELECTRON Eclipse Star is a multi-target sputtering equipment used in thin-film deposition. It is suitable for coating various films of different materials, including metals and dielectrics. MRC Eclipse Star can produce films with excellent uniformity and adhesion, making it excellent for production of optoelectrical and flat panel devices. The sputtering system is based on a multi-target magnetically-biased RF-excited chamber. The unit is capable of performing sputtering from two targets simultaneously, enabling higher deposition uniformity and faster processing times. TEL Eclipse Star is equipped with a highly sensitive reactive gas feeding machine for tunable process control. The valves and pumps can be programmed within an integrated controlling tool, which allows users to precisely monitor and adjust process parameters. An integrated vacuum asset allows for low base pressure operation and efficient sputtering. Eclipse Star's highly efficient target designs enable higher deposition rates and thicker films. The maximum film thickness can exceed 14 microns. Additionally, TOKYO ELECTRON Eclipse Star can precisely deposit thin films with high accuracy and uniformity. Its advanced features also allow operators to achieve finer control over film properties, such as etch rate and thermal stability. MRC / TEL / TOKYO ELECTRON Eclipse Star's user interface provides various features to log, analyze and store data on the process parameters. It complies with applicable global safety and environmental standards to ensure the protection of users and the environment. The user is also able to install optional modules, such as remote access and remote web-based control, for comprehensive monitoring of the model. MRC Eclipse Star is suitable for processing a variety of materials, including metals, dielectrics and other materials. It comes equipped with a range of cleaning accessories and a selectable plasma pre-cleaning unit for excellent thin-film deposition quality. The equipment can be used to produce smooth and crack-free films with excellent adhesion, ideal for use in high-precision applications. In conclusion, TEL Eclipse Star is a highly advanced sputtering system, with features such as multiple targets, precise control of the process parameters, and excellent thin-film deposition quality. It is suitable for a number of applications and is well suited to production of optoelectrical and flat panel devices.
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