Used NANOTEC SPH-200T #9048860 for sale

NANOTEC SPH-200T sputtering equipment is a user-friendly sputter deposition system designed to deposit thin films on a variety of substrates with ease. It is equipped with a (RF) radio frequency high frequency (RF) power supply and a high-precision, closed-loop control unit. It has a chamber size of 300 x 200 mm, and is suitable for use in the thin film deposition of rigid and flexible substrate types. SPH-200T is ideal for depositing a wide range of thin film materials onto substrates such as glass, quartz, oxides, metals, plastics, etc. It utilizes up to five separate targets, with up to two being available for 18 inch substrate sizes. It is also capable of simulating multiple-layer processing with one target. NANOTEC SPH-200T machine utilizes different RF sputter modes for different application needs. The High Density (HD) mode is ideal for applications where a higher uniformity at a high deposition rate is desired, and the Low Density (LD) mode is suitable for sputtering onto more difficult or fragile substrates, such as flexible substrates or oxidized semiconductor wafers. SPH-200T tool can also be used for plasma-enhanced deposition (PED) of reactive gases such as oxygen and nitrogen. The asset's integrated, user-friendly control software enables efficient and accurate thin film deposition. The user can monitor deposition parameters, such as the sputtering pressure, power and time, as well as temperature. NANOTEC SPH-200T sputtering model is easy to operate, maintain and repair. It is reliable, extremely safe and cost-effective to use. Its modular design and small size make it adaptable for use in different laboratory or manufacturing environments. With its compact design, it is also easy to perform process validation and replication.