Used NEXX SYSTEMS Apollo XP #9137851 for sale

NEXX SYSTEMS Apollo XP is a precision sputtering equipment designed for R&D and mass production applications. Apollo XP is capable of sputtering various target materials such as metals, oxides, and semiconductors with low power consumption and high accuracy. The system is equipped with a vertical target arrangement for uniform sputtering, and a high-energy ion source for bombardment of the target. It features a vacuum chamber with a large volume capable of accommodating multiple process heads and allows for the deposition of thin films on a variety of substrates, from wafers to flat panel displays. NEXX SYSTEMS Apollo XP utilizes advanced computer controlled film-deposition control software to accurately monitor and adjust process parameters. It provides several levels of programmability and can manage up to 16 sputtering targets at a time, up to 24" of usable target area, and up to 21″ of substrate. With its advanced Q series targets, Apollo XP offers a reliable, flexible and cost-effective method of producing optically balanced thin-film structures. The unit is designed for intuitive operation with the aid of a 9" diagonal touchscreen controller which features Ethernet Control and Machine Diagnostics, enabling users to remotely monitor and adjust the process parameters over a network. In addition, the tool has an integrated Class-1 cleanroom compatible design, with each process head containing individual inlets for a variety of gases such as Oxygen, Hydrogen, Nitrogen, Argon, Helium, and many more. NEXX SYSTEMS Apollo XP boasts precise temperature control, with a temperature range of +4°C to +250°C, and a uniformity of ±1°C. It also utilizes a state-of-the-art cooling asset which keeps the internal cooling model temperature within 5°C of ambient. This equipment maintains optimal stability for all processes and creates optimal conditions for precise thin film deposition. Apollo XP is a reliable and efficient sputtering system specifically designed to meet the needs of R&D and mass production environments. It offers high-precision thin film deposition at an affordable cost and is an ideal choice for a variety of thin-film applications.