Used NEXX SYSTEMS Nimbus 314HP #9263222 for sale

NEXX SYSTEMS Nimbus 314HP is a complete membrane sputtering equipment designed for research and development applications. Its primary feature is its capability to sputter multiple films or layers simultaneously, while retaining high control of the deposition rate and film thickness over a relatively large area. Built on the versatile NEXX High Speed Chuck (NC), Nimbus 314HP sputtering system offers an advanced design for efficient, fast and accurate film deposition. Its sophisticated design, materials, and methods of operation all work together to allow for higher energy deposition rates and faster process times than other systems in its class. Unlike other comparable systems, NEXX SYSTEMS Nimbus 314HP does not utilize ion-beam etching in order to achieve high control when sputtering films and layers. Nimbus 314HP features a range of key features that make it an ideal choice for sputtering films and layers. It has a high-density RF plasma source, which allows for higher plasma ionization density and accelerates film deposition. It also has a large target-loaded coil design, which helps ensure even film distribution. Additionally, the deposition rate can be fine-tuned to allow for highly accurate and repeatable deposition over a large area. This precision control also benefits from the unit's high-stability process chamber, which ensures uniform deposition across the sample surface. In addition, NEXX SYSTEMS Nimbus 314HP is designed to be user-friendly, with the inclusion of a full graphical user interface (GUI) for programming and monitoring the operation of the machine. This makes it easy for users to monitor and adjust the deposition rate, monitor the film thickness, set up goals for deposition, and save process profiles for future use. In conclusion, Nimbus 314HP is a high performance sputtering tool that is capable of producing highly accurate, uniform films and layers over a large area. Its features, including the high-density RF plasma source, the target-loaded coil design, the high-stability process chamber and the full graphical user interface (GUI) makes it an ideal choice for research and development applications.