Used NEXX SYSTEMS Nimbus 364XP #9212853 for sale

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ID: 9212853
Wafer Size: 12"
Sputtering system, 12" Loadport type: Porta 300, 12" EFEM Robot type: GENMARK GB7 (3L7S030635) Degas Tray type: T-cool RF Generator: ICP 3155031-031A RF Match (5) Magnetrons: Magnetron types: Ti (G1) TiW(G1) Cu (M4) Cu (M4) Cu (M4) 3152422-112S Magnetron power supply MFC Type: MFC1-Model: 1179A22CR15V-S MFC2-Model: 1179A00422CR15V EBARA VOS100P Dry pump Cryo pump (etch chamber): CTI-8F Cryo pump, p/n: 8116199G001 Cryo pump (dep chamber): CTI-8F Cryo pump, p/n: 8115914G001 Cryo pump side (dep chamber): CTI-8F Cryo pump, p/n: 8116199G001 Ion gauge (etch chamber): 354005-YE-T Baratron (etch chamber): 627BU5TDDIB Ion gauge (dep chamber): 354005-YE-T Baratron (dep chamber): 627BU5TDDIB.
NEXX SYSTEMS Nimbus 364XP is a robust, high-performance sputtering equipment designed for critical applications. The system is constructed with an all-stainless steel interior and an aluminium exterior for superior durability and high-level performance. Nimbus 364XP includes a 4-chamber reaction chamber that is capable of processing a wide variety of materials simultaneously with precise control of the process parameters. The unit also includes high-end power supplies, an integrated 3D stepper motor for precise positioning of the sample holders, and the newly designed VacuumMaster Plus Control Machine (VMPC) to ensure consistent and reliable operation. The high-end power supplies built into NEXX SYSTEMS Nimbus 364XP provide the necessary power to sputter the material of choice and make use of advanced pulse-width modulation and voltage pulsing techniques to ensure ideal plasma conditions that are critical for a perfectly repeatable process. There is also a Gas Flow Control Unit (GFCU) integrated with the tool to provide accurate control of gas flow through the chamber during the process. The integrated reaction chamber of Nimbus 364XP is composed of four separate chambers, each of which is capable of sputtering different materials in order to ease the process of multiple layers and provide consistent and predictable results. The 3D stepper motor ensures precise positioning of the sample holders in each chamber as required in order to optimize the process. The VacuumMaster Plus Control Asset (VMPC) ensures reliable and consistent operation of the model, with detailed error logging and real-time status monitoring. The VMPC also includes programs that allow users to monitor process parameters, adjust the process as required, and monitor progress. Overall NEXX SYSTEMS Nimbus 364XP provides a powerful and reliable sputtering equipment for producing precise layers of thin films. The system provides excellent repeatability and control of process parameters, and its versatile four-chamber design allows for processing of multiple materials simultaneously. The advanced power supplies and integrated 3D stepper motor ensure excellent performance, while the VMPC ensures reliable and consistent operation.
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