Used NRC / VARIAN 3115 #70870 for sale
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ID: 70870
Thermal evaporator. Includes 18 x 30" tall stainless steel bell jar, 2 KVA filament power supply with tap switch, M4 diffusion pump, cryo baffle and 17 cfm mechanical pump. With ion/tc gauging and 701 automatic valve sequencer. Counter weighted hoist.
NRC / VARIAN 3115 is a fully automated sputtering vacuum system designed for highly precise thin film deposition applications. It is widely known for its high performance, robustness, and for its user-friendly design. The system is equipped with an advanced rotary sputter gun, which is capable of depositing both conductor and insulator thin films. In addition, PLC (Programmable Logic Controller) and blower pressure control are utilized, providing precise process monitoring and maintenance efficiency. The chamber of NRC 3115 is exceptionally clean, allowing for the deposition of thin film layers with excellent reproducibility and uniformity. It is equipped with a variable depth target holder and in situ rotary target alignment which eliminates the risk of sticking targets. Vacuum levels are stable and, during deposition, pressure control is regulated using the built-in mass flow controller. VARIAN 3115 is designed to handle all types of sputtering processes, including thin film deposition, ultra-thin film layers, and layered deposition processes like multilayer stacking. Temperature control is accomplished through a resistive heating element that can be used to provide uniform temperature across the sputter target. This ensures uniform and perfect coverage of sensitive materials. Sputtering quantity and composition of the thin film layers can be precisely controlled, to within +/- 0.5%, by adjusting the process parameters. Thickness control can easily be done using an optical pyrometer or an ellipsometer. The large chamber size of 3115, along with its continuous process monitoring, makes the production of large-scale components relatively effortless. NRC / VARIAN 3115 is a valuable tool in the production of vacuum components, and with its wide range of features and performance parameters, it is capable of successfully handling a variety of sputtering processes. Its reliable and user-friendly design makes it an excellent choice for quality thin film deposition applications.
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