Used NRC / VARIAN 3117 #151541 for sale

Manufacturer
NRC / VARIAN
Model
3117
ID: 151541
Thermal evaporator 18 x 24" Pyrex bell jar on 25" stainless baseplate VARIAN cryopump 2kVA filament transformer Control and tap switch Manual valves and ion/tc gauge.
NRC / VARIAN 3117 is a low-pressure direct current (DC) magnetron sputtering equipment designed for use in high-precision deposition processes. The sputtering system utilizes a two-pocket magnetron sputter head to deposit high-quality coatings on a variety of substrate materials. The sputtering unit contains an advanced radio frequency (RF) electrical machine designed to maximize deposition yield and uniformity. It is capable of depositing a wide range of materials, from metals to semiconductors and insulators. NRC 3117 also includes a vacuum tool to create a near-perfectly clean environment in which to sputter, as well as a number of safety features to ensure that the asset meets government standards. The vacuum model features a seven-stage mechanical-turbo pump, diaphragm pump, and Pirani gauge to evacuate samples up to base pressures of approximately 1.3 x 10-6 mBar. The equipment is also equipped with a cold trap to reduce outgassing, a gas separator to ensure that deposited metal is pure sputtered metal, and ionization gauge to measure the level of atmospheric contamination. The sputtering head can be loaded with a variety of sources, from metal to insulator. The power supplies in VARIAN 3117 can be configured for DC magnetron sputtering and RF or pulsed DC sputter deposition. The RF power supply is designed for high-power loads and rapid frequency switching, allowing for precise control over the deposition rate. It is capable of adjustable RF power from 0 to 1.2 kW and adjustable pulse width from 0 to 4 μS. The head is designed for fast response and high throughput, and the process conditions can be adjusted for optimal film growth. 3117 provides a wide range of temperature control, from ambient to 930°C (1706°F). The high-temperature crucible design prevents contamination of the substrate due to thermal gradients. NRC / VARIAN 3117 is also equipped with advanced software, allowing for closed-loop feedback control and microprocessor-assisted operation. The user-friendly interface allows for real-time monitoring, logging, and control of the sputtering and ancillary processes. Overall, NRC 3117 is an advanced, versatile sputtering system that can be used in a variety of applications. The user-friendly interface and wide range of control parameters make it ideal for high-precision deposition processes.
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