Used NRC / VARIAN 3117 #171831 for sale

NRC / VARIAN 3117 is a sputtering equipment used in thin film deposition processes. It is a closed-loop DC power supply system and is capable of producing a wide range of DC bias voltages ranging from 0V to -700V. The unit comes with a range of features, including both manual and automatic sputtering control, high-pressure DC sputtering, high-rate sputtering, and ultra-high-rate sputtering. The machine can also be configured for various materials, including aluminum, titanium, gold, and copper. This sputtering tool operates in a vacuum chamber that is filled with a low-pressure gas, typically argon or nitrogen. The gas is generated by an electron beam vacuum source and is circulated through the chamber by a blower fan. This gas maintains a stable atmosphere within the chamber and also helps to prevent the build-up of deposits on the surface of the chamber walls. Within the chamber, a rotating magnetron is used to generate ions which are then sent towards the sample. The sample is typically placed onto a substrate holder that can be moved up and down and rotated while the sputtering process is underway. The holder is also heated in order to ensure that the materials sputtered layer by layer onto the sample adhere well to the substrate. The power supply to the magnetron can either be set manually, or a computer-controlled program can be used to automate the sputtering process. In either case, the current passing through the magnetron is measured and used to adjust the speed and intensity of the ion bombardment. This enables precise control over the sputtering process. NRC 3117 sputtering asset also offers a convenient way to monitor the process. A built-in video camera and monitor provides a real-time view of the sputtering process. Additionally, integrated circuit software and hardware allow for accurate measurements of the quality of the deposition process. Overall, VARIAN 3117 sputtering model is designed for precise deposition of thin films. Its range of features, flexibility, and monitoring capability make it an ideal choice for a wide variety of deposition applications.