Used NRC / VARIAN 3117 #3842 for sale

NRC / VARIAN 3117 is a high-performance sputtering equipment designed to produce thin film deposition on a variety of substrates. The system is capable of deposition rates exceeding 500 Angstroms per minute and is used in the semiconductor manufacturing industry, as well as in the optics, MEMS, and thin film industries. NRC 3117 features an optimized Pulsed DC Sputter Source with a magnetron configuration. This configuration enables precisely controlled thin film deposition with uniform coverage on substrates. The unit also includes a single sputter source that can be configured for either gas- or layer-type sputtering. VARIAN 3117 is equipped with advanced deposition control capabilities, such as the ability to monitor deposition rates and make adjustments in real time. The machine also provides precise control of the film's morphology and impurity levels through the adjustable pressure of the sputtering target. 3117 has a modular design, which enables quick installation and operation setup. The tool is also equipped with advanced diagnostics capabilities which provide valuable data regarding the performance of the sputtering asset. A range of automation features have also been incorporated into the design, including automatic cassette loading, substrate size detection, and substrate-positioning controller. NRC / VARIAN 3117 is fully compliant with key safety-related standards such as NFPA-79 and CSA C22.2 No.14-91. It is also capable of standardizing and validating production processes through its generator permit-to-operate functionality. NRC is also capable of providing highly accurate results, even when production speed is increased. Overall, NRC 3117 model is a powerful, efficient sputtering equipment that offers a wide range of optimization capabilities for consistent thin film deposition on various substrates. Its versatile design, coupled with its advanced diagnostics and automation capabilities, make it suitable for a variety of production needs.