Used NRC / VARIAN 3117 #9081339 for sale

Manufacturer
NRC / VARIAN
Model
3117
ID: 9081339
E-beam evaporator High vacuum station Includes: SS Chamber: 18" dia x 20.5" tall With electro mechanical hoist on 20" SS baseplate VARIAN M6 Diffusion pump Rated: 1500 l/s air NRC / VARIAN 316 LN2 Baffle electro pneumatic valves with sequencer Mechanical roughing pump: 17 CFM Does not include helium mass spectrometer.
NRC / VARIAN 3117 is a ceramic-to-metal/metal-to-ceramic sputtering equipment specially designed for the Vacuum Industries. This sputtering system is built for the magnetic tape and disk industry, optoelectronic device production, and integrated circuit (IC) industry. It is versatile in that it can be used for multiple applications, including coating plastic substrates, chrome on glass, gold-on-gold and ferrite sputtering, and ion implantation. NRC 3117 sputtering unit consists of a vacuum chamber, a holding fixture, air cooled cathode magnet and a power supply. The vacuum chamber is built with an isolating diaphragm and made up of a low conductivity material such as stainless steel and aluminum. This streamlined design is intended to be resistant to leeching out of the mediums being housed inside the chamber, and prevent contamination of the work material and equipment. VARIAN 3117 sputtering machine uses two parallel-plate electrode systems and a high-power direct current (DC) magnetron power supply to provide efficient, homogeneous ion bombardment. The DC magnetron plasma source is used for creating a high density of argon ions, which are then directed towards the target substrate. The power source is connected to a variable power transformer which is used to adjust the power to create a uniform layer of material over the surface. 3117 also contains a cooling tool to manage the temperature of the chamber, which aids in the quality of the sputtered material and creates a more controlled environment. In order to hold and move the target substrate in the sputtering chamber, NRC / VARIAN 3117 is equipped with a movable specimen holder or face plate. This makes it easy to load and unload specimens in and out of the chamber. The holder is also equipped with a gas handling asset, which is important for the sputter ionization process. NRC 3117 can sputter many different types of materials such as aluminum alloys, copper, gold, and nickel-chromium alloys. This sputter model is especially well suited for achieving exceptional uniformity of ultra-thin layers and distinct patterns. This sputter equipment is widely used for fabricating low-cost prototypes and sub-assemblies for semiconductor products, as well as for general manufacturing operations. In addition, this sputtering system can be used in a variety of applications, such as deposition of dielectric layers and optical components. VARIAN 3117 sputtering unit is one of the most reliable and versatile systems on the market and is widely used to provide dependable and reproducible results. This machine provides unparalleled speed, accuracy, and control in producing high quality, reliable parts.
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