Used NRC / VARIAN 3177 #9144755 for sale

NRC / VARIAN 3177 is a physical vapor deposition equipment that is used to sputter-deposit thin films on substrates. It is composed of a small modules consisting of a sputtering chamber including the DC power supply for generating the sputtering process, a pumping station, the mechanical platform and the control unit. Additionally, NRC 3177 system includes components for film characterization and other advanced features. The sputter deposition module is designed to evaporate material from a target (typically metal or alloys) onto the substrate using a DC glow discharge process. The DC power supply employed here uses a glow discharge to generate a plasma field from the target material which causes the target atoms to be ejected onto the substrate when ions are attracted to the substrate. The deposition process is regulated by the material used, the chamber pressure, the applied power and the working distance between the target and the substrate surface. The pumping station consists of a turbomolecular pump and a mechanical pump to maintain the necessary vacuum level in the sputtering chamber. The software control unit monitors and changes the gas flow ratio to control the chamber pressure. The mechanical platform houses the target material, the substrate carrier and the lateral bearings. The targets are typically circular and up to 8" in diameter, and the substrate carrier is adjustable to accommodate various sizes of substrates. The platform also houses an advanced sample temperature controller, enabling the user to precisely control the temperature of the substrate. The control unit consists of a personal computer running the software interface, which is responsible for controlling the various components of the unit. It has an intuitive user interface, allowing the user to program different deposition parameters according to the desired properties of the film. It also offers tools for administering and archiving experimental data. VARIAN 3177 sputtering machine provides high-quality thin film deposition and is easily upgradable to meet the high demand of today's thin-film devices. The sputtering process is well-suited for the deposition of oxides, nitrides, pure metals and metal alloys, making it suitable for a variety of different applications. The tool is reliable, easy to use and an ideal choice for a wide range of applications.