Used OERLIKON / BALZERS LLS EVO #9208365 for sale

OERLIKON / BALZERS LLS EVO is a highly advanced sputter deposition equipment used in industrial and research laboratories for the manufacture of thin-film coatings. It offers advanced performance through a number of unique features, providing advanced control over the deposition of material onto the substrate. The basic sputtering system consists of a vacuum chamber, with two separate sources physically positioned within the chamber and connected to a power supply. The sources can be either cylindrical or planar, with a variety of source materials. The feeds to the sources are provided by solid-state valves that allow for precise control over input materials. The chamber can operate under either an ultra-high vacuum environment or under a low-pressure reactive environment. This feature provides the flexibility to produce the desired material on the substrate. BALZERS LLS EVO's RF source enables the production of highly uniform coatings, reducing the likelihood of high-defect areas within the materials. This is achieved by using a radio frequency signal to create a resonant frequency between the anode and cathode surface. This resonance increases the number of ionized particles in the chamber, which in turn enhances the uniformity and rate of deposition. OERLIKON LLS EVO also incorporates a patented solid-state shutter unit. This machine is extremely fast and allows for precise pulse control. Pulsing enables higher ion populations at peak power as well as the ability to rapidly start and stop deposition cycles. This results in increased ionization of particles, allowing for shorter deposition times and higher coating quality. LLS EVO also offers quick and easy wafer exchange and handling. An exceptionally precise two-axis aligner is used to move the wafers between chambers. This enables precise substrate placement for optimal deposition. When combined with its advanced control systems, OERLIKON / BALZERS LLS EVO provides an extremely versatile tool for producing high-quality thin-film coatings. The chamber is capable of producing a wide variety of materials under a range of exposure conditions, with low-defect rates. This asset is extremely efficient and is well-suited for production line applications, as well as research and development in coating technologies.