Used OERLIKON / BALZERS Sprinter #9236424 for sale

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ID: 9236424
Vintage: 2000
Sputtering systems (8) Chambers Cathode / Power ARQ21 RF / ADVANCED ENERGY 5513 ARQ21 RF / ADVANCED ENERGY 5513 ARQ21 DC / ADVANCED ENERGY Pinnacle ARQ21 DC / ADVANCED ENERGY Pinnacle ARQ21 RF / ADVANCED ENERGY 5513 ARQ21 DC / ADVANCED ENERGY Pinnacle ARQ21 DC / ADVANCED ENERGY Pinnacle 2000 vintage.
OERLIKON / BALZERS Sprinter is a high-end, advanced sputtering equipment for various thin-film coating applications. This system is designed to achieve high deposition rates with versatile options for customizing the process. It utilizes a multi-stage sputtering geometry, which improves starting materials and reproducibility. The unit also features material independent cathodes, allowing for the deposition of a range of materials, as well as variable power supplies, to achieve optimal coating conditions. BALZERS Sprinter includes a two-in-one cathode/target design, providing efficient material consumption and high throughput. The gas injection machine guarantees uniformity and homogeneity throughout a sputtering chamber, while the adaptive process control ensures that the process stays in line. The distinctive heater design, in combination with adjustable RF power levels, allows for pre-heating and controlling the temperature of the target materials. OERLIKON Sprinter is equipped with a quartz monitor, giving it optical fiber capability and the highest resolution optics available for coating and sputtering processes. It also has low-maintenance components, such as the quartz crystal monitor with integrated control systems, facilitating the prevention of dust buildup on the substrate. It also includes contamination prevention systems that ensure efficient, defect-free material deposition. Finally, the defect-free surface coverage offered by Sprinter's white ceramic chamber enables a wide variety of applications. In conclusion, OERLIKON / BALZERS Sprinter sputtering tool offers high-throughput, high-resolution performance for thin-film coating applications. The asset provides a material independent cathode, variable power supplies, low-maintenance components, and a two-in-one cathode/target design that yield efficient material consumption. Finally, the advanced features, such as the gas injection model, heater design and adaptive process control, make this equipment an ideal choice for those in need of accurate and consistent sputtering processes.
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