Used OERLIKON / UNAXIS Clusterline 200 #293643906 for sale

ID: 293643906
Sputtering system.
OERLIKON / UNAXIS Clusterline 200 sputtering equipment is an advanced and versatile process for depositing thin films onto various substrates, such as metals, ceramics and plastics. This tool enables the deposition of metallic, semiconductor and dielectric films from a wide range of materials sources using a variety of techniques. The particular sputtering method employed in UNAXIS Clusterline 200 is referred to as a Single-Batch Sputtering Process. OERLIKON Clusterline 200 is designed for reliable and reproducible processing. A number of features contribute to its superior performance, including its automated control and process monitoring, high-precision positioning and load locking. Additionally, it contains a number of innovative design elements that assure the highest quality films and reliable performance. These elements include an additional chamber to house computer-controlled robotic arms, an optical monitoring system and a closed-loop process control unit. During operation of Clusterline 200, several process parameters are monitored simultaneously. These parameters may be adjusted in real-time, allowing for fine-tuning of the deposition conditions to ensure high film quality and yield. Furthermore, the machine is equipped with a plasma generator and can be loaded with up to four different target materials, allowing for the deposition of multiple layers in a single batch. OERLIKON / UNAXIS Clusterline 200 can be used for a wide range of applications including semiconductor manufacturing, microelectronic device fabrication and optical coatings. The tool is suited for both small- and large-scale productions and is extremely flexible due to its ability to be configured according to the customer's specific needs. Additionally, it offers users extensive control over process parameters, ensuring economical and efficient production. Overall, UNAXIS Clusterline 200 is a multi-purpose, reliable sputtering tool that is ideal for high-quality and high-throughput thin film deposition. Its sophisticated design and automated control asset guarantee the highest film quality and uniformity, assuring users of a successful production process.
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