Used PERKIN ELMER 2400 Series II #293767525 for sale
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PERKIN ELMER 2400 Series II is a high-performance sputtering equipment that offers advanced capabilities for thin film deposition in various research and industrial applications. This system is designed to provide precise control over the sputtering process, enabling users to deposit uniform and high-quality thin films with exceptional reproducibility. The main components of 2400 Series II sputtering unit include a target holder, substrate holder, RF power supply, gas inlet machine, vacuum chamber, and a controlling unit. The target holder is used to hold the sputtering target material, which can be made of various metals or compounds depending on the desired thin film composition. The substrate holder is designed to securely hold the substrate material on which the thin film will be deposited. The RF power supply is used to generate a high-frequency RF plasma in the sputtering chamber, which is essential for the sputtering process. The gas inlet tool allows users to introduce various process gases into the chamber to control the deposition conditions and film properties. The vacuum chamber is designed to create a high vacuum environment necessary for the sputtering process to efficiently take place. One of the key features of PERKIN ELMER 2400 Series II sputtering asset is its advanced plasma control technology, which enables precise control over the plasma parameters such as plasma density, ion energy, and ion flux. This technology allows users to optimize the sputtering process for specific thin film deposition requirements, leading to improved film quality and adhesion. The model also offers a range of deposition modes, including DC, RF, and pulsed DC sputtering, allowing users to tailor the deposition process to achieve the desired film properties. Additionally, the equipment is equipped with advanced monitoring and control features, such as real-time film thickness measurement, gas flow control, and automated process control, ensuring consistent deposition results. 2400 Series II sputtering system is highly versatile and can accommodate a wide range of sample sizes and shapes, making it suitable for various research areas such as semiconductor device fabrication, optical coatings, and thin film research. The unit is also capable of depositing multi-layered films, alloy films, and complex oxide films with high precision and repeatability. In summary, PERKIN ELMER 2400 Series II sputtering machine is a state-of-the-art tool for thin film deposition, offering advanced capabilities, precise control, and versatility for a wide range of applications. Its advanced plasma control technology, deposition modes, and monitoring features make it a valuable asset for scientists and engineers working in materials science, semiconductor research, and other related fields.
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