Used PERKIN ELMER 2400 #293656734 for sale
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ID: 293656734
Sputtering system
With load lock
Platen optimum, 4.5"-6"
Load lock reduces pump down time
(3) Cathodes diameter, 8"
CT 8F Cryo vacuum station
LEYBOLD D Mechanical pump
RF Generator
Substrate table:
Water-cooled, 8"
Etch / Bias operations:
Up to 1 kW Etch
Variable bias: 0 to 50%
Control and meters:
Manual override toggle switches for load and tune controls
Target selector
Mode selector
Shutter position switches
RF Power adjust control
RF Power ON / OFF push button
Table bias
Forward power
Reflected power meter.
PERKIN ELMER 2400 is a sputtering equipment designed for industrial use which combines the latest sputtering technologies in a single, easy-to-use platform. With its modular design and multiple processes in a single platform, 2400 provides industrial-grade high-throughput deposition of sputter targets onto large-area substrates. The system features an innovative beam-neutral sputter source that can be configured for multiple sputter modes for different deposition requirements. It also utilizes high-yield process control systems to ensure perfect results. The unit is capable of supporting multiple samples and is designed to offer reliable sputter source operation over extended periods of time. PERKIN ELMER 2400 is powered by a Planar Magnetron Sputter Chuck which provides increased levels of uniformity when sputtering materials onto large coating substrates. This machine's design optimizes the surface area of the substrate for a uniform, uniformity-controlled sputtering process. This tool also includes a modular planar magnetron that can be adjusted to meet specific sputter needs and provide excellent results. 2400 also features advanced features and controls, such as automated process tracking and a variety of software packages that enable users to monitor and adjust their process parameters. Additionally, the asset is designed to minimize ions to eliminate the need for additional shielding. PERKIN ELMER 2400 is an industrial-grade sputtering model that offers superior performance, extensive features, and reliable operation. Its modular design and multiple process control systems result in increased levels of uniformity when sputtering large coating substrates. The equipment is also designed to offer reliable sputter source operation over extended periods of time, which makes it the perfect choice for industrial-grade sputter tasks.
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